<?xml version="1.0"?>
<feed xmlns="http://www.w3.org/2005/Atom" xml:lang="en">
	<id>https://wiki.opensourceecology.org/index.php?action=history&amp;feed=atom&amp;title=Open_Source_Photolithography_System</id>
	<title>Open Source Photolithography System - Revision history</title>
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	<updated>2026-05-14T17:30:21Z</updated>
	<subtitle>Revision history for this page on the wiki</subtitle>
	<generator>MediaWiki 1.39.13</generator>
	<entry>
		<id>https://wiki.opensourceecology.org/index.php?title=Open_Source_Photolithography_System&amp;diff=164277&amp;oldid=prev</id>
		<title>Eric: Created Page + Added Basic Categories + Info</title>
		<link rel="alternate" type="text/html" href="https://wiki.opensourceecology.org/index.php?title=Open_Source_Photolithography_System&amp;diff=164277&amp;oldid=prev"/>
		<updated>2018-01-20T04:22:04Z</updated>

		<summary type="html">&lt;p&gt;Created Page + Added Basic Categories + Info&lt;/p&gt;
&lt;p&gt;&lt;b&gt;New page&lt;/b&gt;&lt;/p&gt;&lt;div&gt;=Basics=&lt;br /&gt;
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- Part of the [[Open Source Advanced Materials Construction Set]]&lt;br /&gt;
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- Essentially a better [[Open Source PCB Photoengraving System]] (ie smaller traces can be made;to CPU Levels instead of PCB Levels)&lt;br /&gt;
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- A device that uses a photosensitive maskant and a laser/dlp projector/electron beam to create the traces in the maskant.  This is then etched using a chemical etchant&lt;br /&gt;
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=Used For=&lt;br /&gt;
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- The [[Open Source Advanced Electronics Construction Set]]&lt;br /&gt;
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=Industry Standards=&lt;br /&gt;
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=Existing Open Source Devices=&lt;br /&gt;
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=Minimum Viable Product=&lt;br /&gt;
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- Fast&lt;br /&gt;
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- Easy to Use (upload file and press print)&lt;br /&gt;
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- Recycles its own / can use recycled chemicals&lt;br /&gt;
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- Cheap to run&lt;br /&gt;
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- Scalable (both in physical size ,and precision/ability (ie pcb engraving at the low end and cpu manufacture at the high end)&lt;br /&gt;
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=Basic Design=&lt;br /&gt;
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==Feedstock Module==&lt;br /&gt;
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- 1 or more of these&lt;br /&gt;
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- Holds PCB&amp;#039;s, Silicon wafers etc&lt;br /&gt;
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==Conveyor Belt Module==&lt;br /&gt;
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- Carryies feedstock from the feedstock module to the next module&lt;br /&gt;
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- should be relitively unreactive (ie Plastic or ceramic)&lt;br /&gt;
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==Prewash Module==&lt;br /&gt;
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- Washes and dries the feedstock to prevent contamination errors in the next modules&lt;br /&gt;
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==Photoresist application module==&lt;br /&gt;
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- Applies the Photoresist&lt;br /&gt;
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==Exposure Module==&lt;br /&gt;
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- Exposes the photoresist to light&lt;br /&gt;
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- Can be either a pattern in front of a UV Lamp, a laser, or a DLP UV Projector&lt;br /&gt;
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==Post Exposure Cleaning Module==&lt;br /&gt;
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- Cleans off the exposed photoresist &lt;br /&gt;
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==Etching Module==&lt;br /&gt;
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- Is a bath of chemical etchant that the conveyor belt dips into&lt;br /&gt;
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- Dissolves the areas not protected by undeveloped photoresist&lt;br /&gt;
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- May use plasma etching instead at this level (possibly)&lt;br /&gt;
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==Post Etching Cleaning Module==&lt;br /&gt;
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- Removes the Etchant&lt;br /&gt;
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==Post Processing Module==&lt;br /&gt;
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- Removes any remaining photoresist + delivers the finished product to the end of the conveyor belt&lt;br /&gt;
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=BOM=&lt;br /&gt;
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=See Also=&lt;br /&gt;
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=Usefull Links=&lt;br /&gt;
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- [https://en.wikipedia.org/wiki/Photoengraving Wikipedia Page on Photoengraving]&lt;br /&gt;
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- [https://en.wikipedia.org/wiki/Photolithography Wikipedia Page on Photolithography]&lt;br /&gt;
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- [http://www.tomshardware.com/picturestory/514-intel-cpu-processor-core-i7.html#s1 How CPU&amp;#039;s Are Made]&lt;/div&gt;</summary>
		<author><name>Eric</name></author>
	</entry>
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