Open Source Spin Coater: Difference between revisions
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(Created Page + Added Basic Categories + Info) |
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=Basics= | =Basics= | ||
- Part of the [[Open Source Advanced | - Part of the [[Open Source Advanced Materials Construction Set]] | ||
- Spins something while coating it with a liquid that dries to create smooth, near perfect coatings (such as photoresist for photolithography) | - Spins something while coating it with a liquid that dries to create smooth, near perfect coatings (such as photoresist for photolithography) | ||
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- Silicon Wafer Construction | - Silicon Wafer Construction | ||
- The [[Open Source Advanced | - The [[Open Source Advanced Materials Construction Set]] | ||
Revision as of 04:28, 20 January 2018
Basics
- Part of the Open Source Advanced Materials Construction Set
- Spins something while coating it with a liquid that dries to create smooth, near perfect coatings (such as photoresist for photolithography)
Used For
- Silicon Wafer Construction
- The Open Source Advanced Materials Construction Set
Industry Standards
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Existing Open Source Designs
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Minimum Viable Product
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Basic Design
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BOM
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See Also
- Open Source Advanced Material Construction Set
- Open Source Photolithography System