Open Source Plasma Cleaner: Difference between revisions
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=Basics= | =Basics= | ||
*A device that cleans off stuff using plasma (plus things listed below) in a low pressure gas enviroment (using a vacuum pump and a radio tranmitter) | |||
*Uses a mixture plasma, light, and things like ozone, not just plasma, all are created by the same process (the ionization of the low pressure gas) and thus it is called a plasma cleaner | |||
=Used For= | =Used For= | ||
*Silicon Wafer Cleaning | |||
*It can also be modified to be used as an etchant (with more power) in the [[Open Source Photolithography System]] , re [[Plasma Etching]] | |||
*Other instances of [[Critical Cleaning]] requiring the level of low contaminants [[Plama Cleaning]] can provide | |||
=Industry Standards= | =Industry Standards= | ||
*[[https://www.sigmaaldrich.com/catalog/product/aldrich/z561673?lang=en®ion=US This Tabletop One]] | |||
=Existing Open Source Designs= | =Existing Open Source Designs= | ||
*[https://www.youtube.com/watch?v=atVSxvbiPg0 This one by the youtube channel "Applied Science" | |||
=Basic Design= | =Basic Design= | ||
==Vacuum Chamber== | ==Vacuum Chamber== | ||
* | |||
==RF Generator== | ==RF Generator== | ||
* | |||
==Coiled RF Antennae== | ==Coiled RF Antennae== | ||
* | |||
==Gas Input== | ==Gas Input== | ||
*Can add special atmospheres such as oxygen, hydrogen, or argon | |||
*Can improve or otherwise modify cleaning profiles by doing so | |||
=BOM= | =BOM= | ||
* | |||
=Internal Links= | |||
* | |||
=External Links= | |||
*[https://en.wikipedia.org/wiki/Plasma_cleaning Wikipedia Page on Plasma Cleaning] | |||
*[https://www.youtube.com/watch?v=atVSxvbiPg0 Applied Science Video on Plasma Cleaning, a definit must watch] | |||
Revision as of 21:07, 16 September 2023
Basics
- A device that cleans off stuff using plasma (plus things listed below) in a low pressure gas enviroment (using a vacuum pump and a radio tranmitter)
- Uses a mixture plasma, light, and things like ozone, not just plasma, all are created by the same process (the ionization of the low pressure gas) and thus it is called a plasma cleaner
Used For
- Silicon Wafer Cleaning
- It can also be modified to be used as an etchant (with more power) in the Open Source Photolithography System , re Plasma Etching
- Other instances of Critical Cleaning requiring the level of low contaminants Plama Cleaning can provide
Industry Standards
Existing Open Source Designs
- [https://www.youtube.com/watch?v=atVSxvbiPg0 This one by the youtube channel "Applied Science"
Basic Design
Vacuum Chamber
RF Generator
Coiled RF Antennae
Gas Input
- Can add special atmospheres such as oxygen, hydrogen, or argon
- Can improve or otherwise modify cleaning profiles by doing so