Open Source Plasma Cleaner: Difference between revisions
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=Existing Open Source Designs= | =Existing Open Source Designs= | ||
Revision as of 21:09, 16 September 2023
Basics
- A device that cleans off stuff using plasma (plus things listed below) in a low pressure gas enviroment (using a vacuum pump and a radio tranmitter)
- Uses a mixture plasma, light, and things like ozone, not just plasma, all are created by the same process (the ionization of the low pressure gas) and thus it is called a plasma cleaner
Used For
- Silicon Wafer Cleaning
- It can also be modified to be used as an etchant (with more power) in the Open Source Photolithography System , re Plasma Etching
- Other instances of Critical Cleaning requiring the level of low contaminants Plama Cleaning can provide
Industry Standards
Existing Open Source Designs
- [https://www.youtube.com/watch?v=atVSxvbiPg0 This one by the youtube channel "Applied Science"
Basic Design
Vacuum Chamber
RF Generator
Coiled RF Antennae
Gas Input
- Can add special atmospheres such as oxygen, hydrogen, or argon
- Can improve or otherwise modify cleaning profiles by doing so