Open Source Plasma Cleaner: Difference between revisions
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=Basics= | =Basics= | ||
*A device that cleans off stuff using plasma (plus things listed below) in a low pressure gas enviroment (using a vacuum pump and a radio tranmitter) | |||
*Uses a mixture plasma, light, and things like ozone, not just plasma, all are created by the same process (the ionization of the low pressure gas) and thus it is called a plasma cleaner | |||
=Used For= | =Used For= | ||
*Silicon Wafer Cleaning | |||
*It can also be modified to be used as an etchant (with more power) in the [[Open Source Photolithography System]] , re [[Plasma Etching]] | |||
*Other instances of [[Critical Cleaning]] requiring the level of low contaminants [[Plama Cleaning]] can provide | |||
=Industry Standards= | =Industry Standards= | ||
*[https://www.sigmaaldrich.com/catalog/product/aldrich/z561673?lang=en®ion=US This Tabletop One] | |||
=Existing Open Source Designs= | =Existing Open Source Designs= | ||
*[https://www.youtube.com/watch?v=atVSxvbiPg0 This one by the youtube channel "Applied Science" ] | |||
=Basic Design= | =Basic Design= | ||
==Vacuum Chamber== | ==Vacuum Chamber== | ||
* | |||
==RF Generator== | ==RF Generator== | ||
* | |||
==Coiled RF Antennae== | ==Coiled RF Antennae== | ||
* | |||
==Gas Input== | ==Gas Input== | ||
*Can add special atmospheres such as oxygen, hydrogen, or argon | |||
*Can improve or otherwise modify cleaning profiles by doing so | |||
=BOM= | =BOM= | ||
* | |||
=Internal Links= | |||
*[[Open Source High Vacuum Chamber]] | |||
**[[Open Source Ultra-High Vacuum Chamber]] (Mostly the same short of using [[Metal Gaskets]] made of [[Oxygen Free Copper]] in special [[CF Flanges]] ) | |||
= | |||
- [ | |||
=External Links= | |||
*[https://en.wikipedia.org/wiki/Plasma_cleaning Wikipedia Page on Plasma Cleaning] | |||
*[https://www.youtube.com/watch?v=atVSxvbiPg0 Applied Science Video on Plasma Cleaning, a definit must watch] | |||
Latest revision as of 23:13, 16 September 2023
Basics
- A device that cleans off stuff using plasma (plus things listed below) in a low pressure gas enviroment (using a vacuum pump and a radio tranmitter)
- Uses a mixture plasma, light, and things like ozone, not just plasma, all are created by the same process (the ionization of the low pressure gas) and thus it is called a plasma cleaner
Used For
- Silicon Wafer Cleaning
- It can also be modified to be used as an etchant (with more power) in the Open Source Photolithography System , re Plasma Etching
- Other instances of Critical Cleaning requiring the level of low contaminants Plama Cleaning can provide
Industry Standards
Existing Open Source Designs
Basic Design
Vacuum Chamber
RF Generator
Coiled RF Antennae
Gas Input
- Can add special atmospheres such as oxygen, hydrogen, or argon
- Can improve or otherwise modify cleaning profiles by doing so
BOM
Internal Links
- Open Source High Vacuum Chamber
- Open Source Ultra-High Vacuum Chamber (Mostly the same short of using Metal Gaskets made of Oxygen Free Copper in special CF Flanges )